Summary
Overview
Work History
Education
Skills
Honors And Awards
Publications And Patents
Activities
Timeline
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Luciana Meli

Albany,NY

Summary

Experienced semiconductor leader with 15+ years of expertise in driving innovation across advanced technologies, with significant expertise on EUV lithography. Skilled in leading large teams to develop next-generation semiconductor processes for logic, chiplet packaging, and AI hardware. Proven ability to manage strategic R&D initiatives, build strong partnerships, and deliver groundbreaking results in collaboration with industry and government stakeholders. Adept at defining technology roadmaps, optimizing processes for advanced nodes, and advancing interconnect yield.

Overview

24
24
years of professional experience

Work History

Senior Manager- Lithography and Metrology Research

IBM
08.2024 - 02.2025
  • Oversee advanced lithography and metrology R&D agenda in logic, chiplet & advanced packaging, emerging memory and analog AI hardware for IBM semiconductors
  • Lead cross- functional teams in defining lithography process and tooling technology definition for our logic programs, including 2nm node collaborations, as well as next generation logic architectures. Within this role, specifically tasked to spearhead the mission of accelerating High NA EUV technology adoption for IBM Research
  • Lead IBM Albany's ecosystem growth strategy, managing commercial and government partnerships in lithography and metrology. This includes supporting EUV accelerator R&D mission as principal investigator for IBM

Senior Manager- Patterning and Metrology Research

IBM
08.2022 - 02.2024
  • Directed resource management and strategic alignment for the lithography, etch, and metrology organization, ensuring efficient execution of key deliverables and support from engineering resources nearing 100 employees
  • Lead lithography process and tooling technology definition for our logic collaborations. This includes maturing our development capabilities in Albany to meet the advanced technology requirements, as well as defining and leading strategic roadmap initiatives for pathfinding activities in logic scaling
  • Cultivated a world-class team in patterning and metrology, enhancing IBM's capabilities in innovation and execution
  • Deliver operational eminence by supporting fab commitment for increased capacity, cycle time, and productivity through new tool bring up, process rationalization, and increased uptime
  • Foster collaboration and deliver client impact with patterning, inspection, and metrology partners to secure a pipeline of innovation

Senior Engineer, Manager- Lithography Research

IBM
05.2019 - 08.2022
  • Directed the execution of IBM's lithography strategy focusing on EUV technologies and their integration into semiconductor processes
  • Led successful joint development partnerships with material, process, and inspection equipment vendors, advancing the state-of-the-art in patterning solutions
  • Deliver improved operational efficiency by overseeing the execution of lithography tool installs, upgrades, and refreshes, as well as tool maintenance and operation
  • Delivered operational excellence by overseeing tool installation, upgrades, and maintenance, driving efficiency improvements in the lithography operation
  • Managed a high-performance team, ensuring successful program delivery while fostering individual growth and visibility within the organization.
  • Provided leadership and technical expertise to deliver 28nm pitch interconnect yield with single exposure EUV. Includes co-optimization of scanner, track and etch processes, imaging solutions, and EUV mask contributions, and generation of the infrastructure necessary to understand stochastic defectivity

Advisory Engineer

IBM
04.2014 - 04.2019
  • Innovated defect inspection strategies to support EUV technology and advanced node development, ensuring defect control for IBM at Albany Nanotech
  • Developed and executed strategies for defectivity control in EUV metal patterning, enhancing process window performance and accelerating yield improvement
  • Led advanced EUV mask-to-wafer inspection methodologies, providing critical insights for the ongoing refinement of patterning processes.
  • Developed EUV lithography scanner protection strategy from chuck contamination due to backside wafer defectivity. Established backside contamination baseline for tooling and developed procedures for tool recovery and excursion mitigation

Advisory Engineer

IBM
05.2013 - 04.2014
  • Provided inspection support and expertise to allow the introduction of new patterning materials with low defectivity
  • Enabled attainment of defect control targets in 22SOI and 14SOI technologies
  • Propagated best known inspection strategies across the lithography area to improve learning cycles for materials and track processes

Research Scientist

Rensselaer Polytechnic Institute
10.2009 - 04.2013
  • Developed and optimized a high-throughput 3D microculture platform for cytotoxicity screening, protein expression, and neural stem cell differentiation, advancing biotechnology applications

Postdoctoral Associate

University of Minnesota
02.2008 - 08.2009
  • Investigated the use of ionic liquids as a solvent medium to study self-assembly kinetics of macromolecular systems, a novel approach which allowed the exploration of annealing conditions that are unattainable with conventional solvents

Visiting Researcher

University of Michigan
10.2005 - 12.2007
  • Designed novel systems to explore nanocomposite material structure-property relationships, advancing understanding of material behavior at the nanoscale.

Research Assistant

The University of Texas at Austin
08.2001 - 10.2005
  • Investigated the impact of supercritical carbon dioxide (scCO2) annealing on the structural stability and self-assembly of various polymer thin film systems

Education

Ph.D. - Chemical Engineering

The University of Texas at Austin
Austin, TX
05.2007

B.S. (Cum Laude) - Chemical Engineering

National University of Mexico (UNAM)
06.2001

Skills

  • Semiconductor technology expertise
  • Strong publication and patent portfolio
  • Strategic planning expertise
  • Outstanding communication skills
  • Deep technical expertise and proven leadership in EUV lithography
  • Proven leadership in cultivating strong relationship in partner ecosystems
  • Proven success in leading teams to innovate and execute
  • Strong technical leadership track record

Honors And Awards

  • Malcolm Lilly Award, for young scientist working in the field of biochemical engineering (2012).
  • E.D. Farmer International Fellowship, University of Texas at Austin (2002 & 2003).
  • National Council for Science and Technology (CONACYT) Scholarship for Graduate Studies (2001-2006).
  • Award for Academic Excellence during Bachelor Studies, UNAM (2001).
  • TELMEX Educational Foundation Scholarship for Undergraduate Studies (1996-2001).
  • Undergraduate Academic Exchange Program, University of California, Berkeley, CA, (1999).

Publications And Patents

100 scientific publications (list available upon request), 22 patents.

Activities

  • SPIE Senior Member since 2022
  • SPIE EUV Program Committee Member since 2019
  • Member of SPIE since 2017
  • Journal Reviewer for Macromolecules, Biotechnology and Bioengineering, Polymer, Applied Physics A.

Timeline

Senior Manager- Lithography and Metrology Research

IBM
08.2024 - 02.2025

Senior Manager- Patterning and Metrology Research

IBM
08.2022 - 02.2024

Senior Engineer, Manager- Lithography Research

IBM
05.2019 - 08.2022

Advisory Engineer

IBM
04.2014 - 04.2019

Advisory Engineer

IBM
05.2013 - 04.2014

Research Scientist

Rensselaer Polytechnic Institute
10.2009 - 04.2013

Postdoctoral Associate

University of Minnesota
02.2008 - 08.2009

Visiting Researcher

University of Michigan
10.2005 - 12.2007

Research Assistant

The University of Texas at Austin
08.2001 - 10.2005

B.S. (Cum Laude) - Chemical Engineering

National University of Mexico (UNAM)

Ph.D. - Chemical Engineering

The University of Texas at Austin
Luciana Meli