Abdalmohsen Elmalk

• Leading metrology application product team in performance & integration department
• My main tasks include: Leading a team of highly skilled engineers, steering the technical product developments, coaching, career development and help on their end-year-reviews
• Member of the product management team helping to set and execute strategy for product development, identify and drive solutions and hands-on technical analyses for product improvement.

• Within the performance & integration department I am working on improving existing applications and designing new applications in the field of e-beam metrology
• Support application development activities & transfer new applications to customer support team
• And engage with customer for new business opportunities.

Integrated to the Application & Customer Support department my tasks are separated into: Worldwide customer advance support (e.g

• CD metrology & overlay optimization for after etch processes to improve CDU & on product overlay performance), Beta testing of brand new options related to holistic lithography, Supporting ASML’s Design for Control (D4C) products which is tackling the current industry requirements for overlay, focus control and critical dimension uniformity (CDU) to meet the future demands by helping customers to design and optimize scanner alignment/metrology targets that can be used to deliver significant improvements to overlay performance, Business support and expertise for new customer’s applications, Team Roles and Responsibilities: Knowledge/skills owner, Competency lead

• Holistic Litho is one of the key projects to enhance lithography stability and precision in production environment
• Keywords: development of ASML products, in-die CD measurement, ownership, Diffraction-based optical scatterometry, In-line metrology system, evaluate shielding efficacy on-product target, customer experience

• As semiconductor structures become increasingly complex, they require even more sophisticated metrology tools for characterization and process control
• Scatterometry takes advantage of the sensitivity exhibited by optical diffraction from periodic structures, and hence is an efficient technique for lithographic process monitoring
• My work has to do with designing an optimal measurement for robust and high performance for high volume manufacturing.

• Study the interfacing of redox proteins to conductive surfaces, the verification of the functionality of surface-assembled proteins, the determination of surface organization and assembly by fluorescence and other imaging techniques, the observation of redox activity by fluorescence detection, and ultimately the engineering of device-oriented structures
• The ultimate goal is to develop biosensors based on enzyme activity, using novel detection and analysis techniques.

• Lab assistant in basic physics, electronics & optics course for undergraduate majors
• Taught introductory courses, including based physics, that dealt with topics in electricity & magnetism, thermodynamics, and optics & modern physics
• Responsibilities for undergraduate courses includes group problem solving activities, laboratory activities, and review sessions
• Others: knowledge in experimental physics, extensive experience with design physics experiment, Lab Equipment Maintenance and Repair, Examinations Officer