A dedicated and analytical candidate eager to apply problem-solving skills in a professional setting, I excel in gathering and meticulously analyzing data with a sharp eye for accuracy. With extensive expertise in Atomic Layer Deposition (ALD) techniques, particularly for ultra-high k dielectric films, I possess a proven proficiency in precise film deposition and enhancing material properties. My adeptness extends to operating diverse deposition instruments encompassing ion-based PVD methods like evaporation and sputtering and Chemical Vapor Deposition (CVD) approaches. Furthermore, my strong background in nano and microfabrication, specifically in photolithography and etching processes, enables me to execute precise pattern transfer and structural development. Notably, I leverage my skills in process integration to harmonize fabrication techniques, ensuring the attainment of desired material structures and properties for optimized device performance. Reliable and adaptable, I bring robust leadership abilities to mentor and supervise projects, thriving in process research and development.